Advanced Energy introduces a new Paramount HP 10013 RF power supply

     Advanced Energy, a global technology leader, is committed to developing a wide range of advanced high-precision power conversion, measurement and control systems and other solutions. The company introduced a new Paramount HP 10013 RF power supply. Following the new product launch, more models will be available for the company's flagship Paramount RF (radio frequency) power supply family.

     Advanced Energy's plasma process equipment power system is suitable for semiconductor etching, dielectric etching, deposition, sputtering, ion implantation and other semiconductor and plasma thin film process equipment. Paramount HP 10013 uses the plasma process power technology that has been leading the market. For example, the Paramount HP 10013 ensures that the Paramount 13.56MHz platform delivers up to 10kW of output power, with the advantage of delivering high energy pulses at a low average power to ensure accurate and repeatable pulse power. The higher power increases plasma density and ion energy to support faster and deeper plasma etching process steps and shorter deposition process times to meet the requirements of advanced high aspect ratio etching processes and new generation applications.

     Peter Gillespie, senior vice president of semiconductor and Computing products at Advanced Energy, said: "Many products on the market today, including consumer products, entertainment devices, industrial products, computing systems and transportation vehicles, almost all use integrated circuits. Following this development trend, the application of high-precision process equipment power systems will be more and more widespread. Our industry must meet these increasing demands and overcome a variety of challenges. Advanced Energy's Paramount product line pioneered pulsed RF technology and is the industry's first series of mass-producible, fully digital RF power systems. "With this new, higher-power offering, Advanced Energy allows our customers to leverage innovative technology to develop more complex, three-dimensional system architectures and entirely new materials."

     The digital architecture of the Paramount platform enables precise power management and enables faster integration of new features without the need for hardware replacement. The full digital control function can track plasma changes for dynamic and real-time detection, and can provide high power output and ensure repeatability of performance. A built-in digital interface ensures that the platform operates in sync with other RF power sources and seamlessly connects to Advanced Energy's suite of leading Navigator and Navigator II digital matching networks. The Paramount series platform is currently the most popular plasma process equipment power solution in the semiconductor industry.