Advanced Energy introduces a new line of MaxStream long-range plasma sources

     Advanced Energy announced the launch of a new line of MaxStream ™ Remote Plasma Source (RPS) products featuring a reaction chamber plasma cleaning system for semiconductor chip processes. The MAXstream family of products is available in several different models and offers a very wide range of operations. Other benefits include high power supply accuracy, superior plasma jet igniting capability over comparable products, and increased stability, making it the most ideal long-range plasma source solution on the market.

     Peter Gillespie, vice president and general manager of semiconductor products at Advanced Energy, said: "Our customers had told us that there was a lack of a high-performance, reliable RPS product in the market, and they wanted Advanced Energy to enter the market and meet their needs. We followed the trend and made their dreams come true. This new line of MAXstream products not only provides customers with a cost-effective and reliable RPS solution for their process equipment, but also allows Advanced Energy to accelerate its entry into the RPS market, which has seen few innovations in recent years but is worth approximately $150 million in annual sales. So far, the products have been very well received in the market, which is very encouraging for us. We will continue to deliver to a number of OEM customers this month, and we expect to continue to achieve excellent results."

     MAXstream is far superior to competing RPS solutions because the dual plasma source ignition core of this new product is designed to ensure plasma ignition stability that is superior to the competition. Since the ignition of each separate attack is very stable and reliable, the entire operation can maintain its stability and reduce the occurrence of bad aircraft. MAXstream also leverages Advanced Energy's years of proven separation of plasma source materials and related technologies to ensure an extended process chamber life cycle and reduce the resulting particles.

     Advanced Energy's MAXstream RPS products can be easily plugged into existing RPS systems to ensure seamless integration and easy replacement. Customers can improve the productivity, performance and stability of their process equipment simply by taking out the consistently underperforming RPS and switching to MAXstream. They also have access to Advanced Energy's global service and support that is superior to the competition. Advanced Energy has more than a dozen service centers around the world to provide customers with field service and application technical support.

     The MAXstream product range includes the MAXstream 300, 600, 800, 1000 and 1200 models with gas flows of 3, 6, 8, 10 and 12 liters per minute, respectively, allowing customers to follow their own processes. Choose a model that fits your budget and gets the most out of your system. The MAXstream 300 is suitable for lower flow processes (up to 3 liters per minute for cleaning) and is smaller than the higher flow models.

     Shaun Wilson, general manager of Advanced Energy's long-range plasma sources, said: "The plasma process used in the production of almost every semiconductor chip requires cleaning of the reaction chamber. With the introduction of the MAXstream series, we provide a robust, reliable and cost-effective solution for our customers' process reaction chamber cleaning systems. We not only reduce the downtime of equipment, but also help the semiconductor industry meet the market needs of the data economy."